Novotný, M.; Remsa, J.; Havlová, Š.; More-Chevalier, J.; Irimiciuc, S.A.; Chertopalov, S.; Písařík, P.; Volfová, L.; Fitl, P.; Kmječ, T.;
et al. In Situ Monitoring of Pulsed Laser Annealing of Eu-Doped Oxide Thin Films. Materials 2021, 14, 7576.
https://doi.org/10.3390/ma14247576
AMA Style
Novotný M, Remsa J, Havlová Š, More-Chevalier J, Irimiciuc SA, Chertopalov S, Písařík P, Volfová L, Fitl P, Kmječ T,
et al. In Situ Monitoring of Pulsed Laser Annealing of Eu-Doped Oxide Thin Films. Materials. 2021; 14(24):7576.
https://doi.org/10.3390/ma14247576
Chicago/Turabian Style
Novotný, Michal, Jan Remsa, Šárka Havlová, Joris More-Chevalier, Stefan Andrei Irimiciuc, Sergii Chertopalov, Petr Písařík, Lenka Volfová, Přemysl Fitl, Tomáš Kmječ,
and et al. 2021. "In Situ Monitoring of Pulsed Laser Annealing of Eu-Doped Oxide Thin Films" Materials 14, no. 24: 7576.
https://doi.org/10.3390/ma14247576
APA Style
Novotný, M., Remsa, J., Havlová, Š., More-Chevalier, J., Irimiciuc, S. A., Chertopalov, S., Písařík, P., Volfová, L., Fitl, P., Kmječ, T., Vrňata, M., & Lančok, J.
(2021). In Situ Monitoring of Pulsed Laser Annealing of Eu-Doped Oxide Thin Films. Materials, 14(24), 7576.
https://doi.org/10.3390/ma14247576