Ruwisch, K.; Alexander, A.; Pollenske, T.; Küpper, K.; Wollschläger, J.
Influence of Oxygen Plasma on the Growth and Stability of Epitaxial NiCo2O4 Ultrathin Films on Various Substrates. Materials 2022, 15, 6911.
https://doi.org/10.3390/ma15196911
AMA Style
Ruwisch K, Alexander A, Pollenske T, Küpper K, Wollschläger J.
Influence of Oxygen Plasma on the Growth and Stability of Epitaxial NiCo2O4 Ultrathin Films on Various Substrates. Materials. 2022; 15(19):6911.
https://doi.org/10.3390/ma15196911
Chicago/Turabian Style
Ruwisch, Kevin, Andreas Alexander, Tobias Pollenske, Karsten Küpper, and Joachim Wollschläger.
2022. "Influence of Oxygen Plasma on the Growth and Stability of Epitaxial NiCo2O4 Ultrathin Films on Various Substrates" Materials 15, no. 19: 6911.
https://doi.org/10.3390/ma15196911
APA Style
Ruwisch, K., Alexander, A., Pollenske, T., Küpper, K., & Wollschläger, J.
(2022). Influence of Oxygen Plasma on the Growth and Stability of Epitaxial NiCo2O4 Ultrathin Films on Various Substrates. Materials, 15(19), 6911.
https://doi.org/10.3390/ma15196911