Hari, S.; Trompenaars, P.H.F.; Mulders, J.J.L.; Kruit, P.; Hagen, C.W.
Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material. Micromachines 2021, 12, 8.
https://doi.org/10.3390/mi12010008
AMA Style
Hari S, Trompenaars PHF, Mulders JJL, Kruit P, Hagen CW.
Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material. Micromachines. 2021; 12(1):8.
https://doi.org/10.3390/mi12010008
Chicago/Turabian Style
Hari, Sangeetha, P. H. F. Trompenaars, J. J. L. Mulders, Pieter Kruit, and C. W. Hagen.
2021. "Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material" Micromachines 12, no. 1: 8.
https://doi.org/10.3390/mi12010008
APA Style
Hari, S., Trompenaars, P. H. F., Mulders, J. J. L., Kruit, P., & Hagen, C. W.
(2021). Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material. Micromachines, 12(1), 8.
https://doi.org/10.3390/mi12010008