On the Usage of Tapered Undulators in the Measurement of Interference in the Intensity-Dependent Electron Mass Shift
Abstract
:1. Introduction
2. Methods
3. Results
3.1. Scattering from One Electron
3.2. Scattering from an Electron Beam
4. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Valialshchikov, M.A.; Ruijter, M.; Rykovanov, S.G. On the Usage of Tapered Undulators in the Measurement of Interference in the Intensity-Dependent Electron Mass Shift. Crystals 2021, 11, 486. https://doi.org/10.3390/cryst11050486
Valialshchikov MA, Ruijter M, Rykovanov SG. On the Usage of Tapered Undulators in the Measurement of Interference in the Intensity-Dependent Electron Mass Shift. Crystals. 2021; 11(5):486. https://doi.org/10.3390/cryst11050486
Chicago/Turabian StyleValialshchikov, Maksim A., Marcel Ruijter, and Sergey G. Rykovanov. 2021. "On the Usage of Tapered Undulators in the Measurement of Interference in the Intensity-Dependent Electron Mass Shift" Crystals 11, no. 5: 486. https://doi.org/10.3390/cryst11050486
APA StyleValialshchikov, M. A., Ruijter, M., & Rykovanov, S. G. (2021). On the Usage of Tapered Undulators in the Measurement of Interference in the Intensity-Dependent Electron Mass Shift. Crystals, 11(5), 486. https://doi.org/10.3390/cryst11050486