Order Article Reprints

Cho H, Lee N, Choi H, Park H, Jung C, Song S, Yuk H, Kim Y, Kim J-W, Kim K, et al. Remote Plasma Atomic Layer Deposition of SiN_x Using Cyclosilazane and H₂/N₂ Plasma. Applied Sciences. 2019; 9(17):3531. https://doi.org/10.3390/app9173531

Cho, Haewon, Namgue Lee, Hyeongsu Choi, Hyunwoo Park, Chanwon Jung, Seokhwi Song, Hyunwoo Yuk, Youngjoon Kim, Jong-Woo Kim, Keunsik Kim, and et al. 2019. "Remote Plasma Atomic Layer Deposition of SiN_x Using Cyclosilazane and H₂/N₂ Plasma" Applied Sciences 9, no. 17: 3531. https://doi.org/10.3390/app9173531

Cho, H., Lee, N., Choi, H., Park, H., Jung, C., Song, S., Yuk, H., Kim, Y., Kim, J. -W., Kim, K., Choi, Y., Park, S., Kwon, Y., & Jeon, H. (2019). Remote Plasma Atomic Layer Deposition of SiN_x Using Cyclosilazane and H₂/N₂ Plasma. Applied Sciences, 9(17), 3531. https://doi.org/10.3390/app9173531