Zhao, M.; Yan, J.; Wang, Y.; Chen, Q.; Cao, R.; Xu, H.; Wuu, D.-S.; Wu, W.-Y.; Lai, F.-M.; Lien, S.-Y.;
et al. The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process. Nanomaterials 2024, 14, 690.
https://doi.org/10.3390/nano14080690
AMA Style
Zhao M, Yan J, Wang Y, Chen Q, Cao R, Xu H, Wuu D-S, Wu W-Y, Lai F-M, Lien S-Y,
et al. The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process. Nanomaterials. 2024; 14(8):690.
https://doi.org/10.3390/nano14080690
Chicago/Turabian Style
Zhao, Mingjie, Jiahao Yan, Yaotian Wang, Qizhen Chen, Rongjun Cao, Hua Xu, Dong-Sing Wuu, Wan-Yu Wu, Feng-Min Lai, Shui-Yang Lien,
and et al. 2024. "The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process" Nanomaterials 14, no. 8: 690.
https://doi.org/10.3390/nano14080690
APA Style
Zhao, M., Yan, J., Wang, Y., Chen, Q., Cao, R., Xu, H., Wuu, D. -S., Wu, W. -Y., Lai, F. -M., Lien, S. -Y., & Zhu, W.
(2024). The Enhanced Performance of Oxide Thin-Film Transistors Fabricated by a Two-Step Deposition Pressure Process. Nanomaterials, 14(8), 690.
https://doi.org/10.3390/nano14080690
