Article Versions Notes

Krenicky T, Goncharov OY, Kuchar J, Sapegina IV, Kudlacek J, Faizullin RR, Korshunov AI, Cerny D. Chemical Vapor Deposition of Tantalum Carbide in the TaBr₅–CCl₄–Cd System. Coatings. 2024; 14(5):547. https://doi.org/10.3390/coatings14050547

Krenicky, Tibor, Oleg Y. Goncharov, Jiri Kuchar, Irina V. Sapegina, Jan Kudlacek, Ravil R. Faizullin, Alexander I. Korshunov, and Daniel Cerny. 2024. "Chemical Vapor Deposition of Tantalum Carbide in the TaBr₅–CCl₄–Cd System" Coatings 14, no. 5: 547. https://doi.org/10.3390/coatings14050547

Krenicky, T., Goncharov, O. Y., Kuchar, J., Sapegina, I. V., Kudlacek, J., Faizullin, R. R., Korshunov, A. I., & Cerny, D. (2024). Chemical Vapor Deposition of Tantalum Carbide in the TaBr₅–CCl₄–Cd System. Coatings, 14(5), 547. https://doi.org/10.3390/coatings14050547