Investigation of Thin Films Using UV-X-Ray Reflectometry
A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Materials Science and Engineering".
Deadline for manuscript submissions: closed (10 December 2021) | Viewed by 2541
Special Issue Editor
Special Issue Information
Dear Colleagues,
UV-X-Ray reflectometry is a powerful tool for the structural characterization of thin films and layered systems. Often coupled with other techniques such as spectroscopic ellipsometry, profilometry, X-ray diffraction, atomic force microscopy (AFM) or X-ray photoelectron spectroscopy (XPS), this technique can be very useful for the determination of the thickness, density, and roughness parameters of layered systems. Two are the most important peculiarities: it is not destructive and can also be applied to insulating materials. In particular, in proximity to the absorption edges, reflectance measurements can give important informations on the physical and chemical state of films and relative interfaces. Important applications are for instance organic and magnetic films. Polarized light reflectivity can be used to follow the growth and to characterize ultrathin organic layers at surfaces and to determine the molecular arrangement and electronic structure of strongly oriented organic ultrathin films. Additionally, X-ray magnetic reflectivity in resonant conditions is a very powerful probe of magnetic films, allowing to extract the interfacial magnetization profiles with nanometer resolution. With the help of an adequate modelization of the system, reflectometry represents an important tool for depth profiling or quality control of thin single or layered systems. In this Special Issue, we explore recent progress and new directions in the use of UV-X-Ray reflectometry for the study of thin films and buried interfaces.
Dr. Angelo Giglia
Guest Editor
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Keywords
- thin films
- UV-X-Ray Reflectometry
- buried interfaces
- depth profiling
- organic films
- magnetic films
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