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Surface Properties of Thin Films

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".

Deadline for manuscript submissions: closed (31 October 2021) | Viewed by 5377

Special Issue Editor


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Guest Editor
Functional surfaces and interfaces. Institut de Ciència de Materials de Barcelona (ICMAB-CSIC) Campus de la UAB, E-08193 Bellaterra, Spain
Interests: surface properties in ambient conditions; hydrophobicity of self-assembled monolayers; atomic force microscopy; ambient pressure X-ray photoelectron spectroscopy; wetting and capillary at the nanoscale; surface properties of ferroelectric thin films; the role of surfaces in heterogeneous ice nucleation
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Special Issue Information

Dear Colleagues,

Since W. Pauli’s famous quote “God made the bulk; surfaces were invented by the devil”, scientists have developed a large list of new techniques to study and even control surface properties. At present, new surfaces are created every day, allowing the tune of specific properties of materials at wish. Probably the most common approach to modify and control surface properties is the growth of thin films on different substrates. From organic self-assembled monolayers to inorganic epitaxial growth using pulsed laser deposition, thin films are created in research centers and companies for a wide range of applications, such as tribology, wetting control, electronic semiconductor devices, energy generation, optical coatings, etc.

In this Special Issue, surface properties of thin films, from the strategies in their fabrication to tune the desired properties to the possible applications of new properties, are highlighted and discussed.

It is my pleasure to invite you to submit a manuscript for this Special Issue. Full papers, communications, and reviews are all welcome.

Prof. Albert Verdaguer
Guest Editor

Manuscript Submission Information

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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Thin film
  • Self-assembled monolayers
  • Coatings
  • Surfaces
  • Thin film multiferroics
  • Thin film batteries
  • Thin-film photovoltaics
  • Superlattices
  • 2-D materials
  • Graphene

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Published Papers (2 papers)

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Research

15 pages, 10655 KiB  
Article
A Novel Simulation Method of Micro-Topography for Grinding Surface
by Qi An, Shuangfu Suo and Yuzhu Bai
Materials 2021, 14(18), 5128; https://doi.org/10.3390/ma14185128 - 7 Sep 2021
Cited by 7 | Viewed by 2357
Abstract
A novel simulation method of microtopography for grinding surface was proposed in this paper. Based on the theory of wavelet analysis, multiscale decomposition of the measured topography was conducted. The topography was divided into high frequency band (HFB), theoretical frequency band (TFB), and [...] Read more.
A novel simulation method of microtopography for grinding surface was proposed in this paper. Based on the theory of wavelet analysis, multiscale decomposition of the measured topography was conducted. The topography was divided into high frequency band (HFB), theoretical frequency band (TFB), and low frequency band (LFB) by wavelet energy method. The high-frequency and the low-frequency topography were extracted to obtain the digital combination model. Combined with the digital combination model and the theoretical topography obtained by geometric simulation method, the simulation topography of grinding surface can be generated. Moreover, the roughness parameters of the measured topography and the simulation topography under different machining parameters were compared. The maximum relative error of Sa, Sq, Ssk and Sku were 1.79%, 2.24%, 4.69% and 4.73%, respectively, which verifies the feasibility and accuracy of the presented method. Full article
(This article belongs to the Special Issue Surface Properties of Thin Films)
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13 pages, 7428 KiB  
Article
Structure and Properties of Zr-Mo-Si-B-(N) Hard Coatings Obtained by d.c. Magnetron Sputtering of ZrB2-MoSi2 Target
by Philipp Kiryukhantsev-Korneev, Alina Sytchenko, Yuriy Pogozhev, Stepan Vorotilo, Anton Orekhov, Pavel Loginov and Evgeny Levashov
Materials 2021, 14(8), 1932; https://doi.org/10.3390/ma14081932 - 13 Apr 2021
Cited by 18 | Viewed by 2535
Abstract
Coatings in a Zr-Mo-Si-B-N system were deposited by the magnetron sputtering of ZrB2-MoSi2 targets in argon and nitrogen. The structure of the coatings was investigated using scanning electron microscopy, X-ray diffraction, energy-dispersive spectroscopy, and glow-discharge optical emission spectroscopy. Mechanical and [...] Read more.
Coatings in a Zr-Mo-Si-B-N system were deposited by the magnetron sputtering of ZrB2-MoSi2 targets in argon and nitrogen. The structure of the coatings was investigated using scanning electron microscopy, X-ray diffraction, energy-dispersive spectroscopy, and glow-discharge optical emission spectroscopy. Mechanical and tribological properties were measured using nanoindentation and pin-on-disc testing. Oxidation resistance and oxidation kinetics were estimated via annealing in air at 1000–1500 °C and precision weight measurements. We found that the coatings deposited in Ar demonstrate a superior combination of properties, including hardness of 36 GPa, elastic recovery of 84%, a friction coefficient of 0.6, and oxidation resistance at temperatures up to 1200 °C. High oxidation resistance is realized due to the formation of the protective (SiO2 + ZrO2)/SiO2 oxide layer, which inhibits the diffusion of oxygen into the coating. Full article
(This article belongs to the Special Issue Surface Properties of Thin Films)
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