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Micromachines
Special Issues
Advanced Optical Manufacturing Technologies and Applications
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Advanced Optical Manufacturing Technologies and Applications

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D：Materials and Processing".

Deadline for manuscript submissions: closed (15 October 2024) | Viewed by 1296

Special Issue Editors

Prof. Dr. Jiang Guo

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Guest Editor
School of Mechanical Engineering, Dalian University of Technology, Dalian 116024, China
Interests: intelligent precision machining; surface integrity; precision measurement
Special Issues, Collections and Topics in MDPI journals
Prof. Dr. Yebing Tian

E-Mail Website
Guest Editor
Institute of Advanced Manufacturing, Shandong University of Technology, Zibo 255049, China
Interests: alloy
Special Issues, Collections and Topics in MDPI journals
Prof. Dr. Zhenzhong Wang

E-Mail Website
Guest Editor
School of Aeronautics and Astronautics, Xiamen University, Xiamen 361005, China
Interests: precision engineering; ultra-precision machining technology
Special Issues, Collections and Topics in MDPI journals
Prof. Dr. Jianguo Zhang

E-Mail Website
Guest Editor
School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
Interests: cutting process; subsurface damage; monocrystalline silicon

Special Issue Information

Dear Colleagues,

This Special Issue will publish selected papers from the 2nd International Conference on Advanced Optical Manufacturing Technologies and Applications, and the 4th International Forum of Young Scientists on Advanced Optical Manufacturing (AOMTA and YSAOM 2024) (https://b2b.csoe.org.cn/meeting/YSAOM2024.html) on micromachines in Xi’an, China, 5–7th July 2024.

We aim to collect high-quality research papers and review articles from AOMTA and YSAOM 2024, which focus on advanced optical manufacturing technology, optical intelligent manufacturing, ultra-precision manufacturing, precision measurement, intelligent sensing and control, and material science. This conference will cover the following main topics:

  1. Large optical mirror and telescope technology;
  2. Micro-nanostructure optics and manufacturing technologies;
  3. Ultra-precision machining technology for optical complex surfaces and functional structures;
  4. Ultra-precision optical measurement technology and equipment;
  5. High-performance manufacturing technology for short-wavelength optical components;
  6. High-efficiency optical precision processing technologies and new methods;
  7. High-performance optical microstructure manufacturing processes and equipment;
  8. Advanced optical coating technology and equipment;
  9. Optical design, assembly, and system modeling technology;
  10. Manufacturing and applications of optofluidic chip and liquid crystal optics.

Papers attracting the most interest at the conference, or that provide novel contributions, will be selected for publication in Micromachines. These papers will be peer-reviewed for the validation of research results, developments, and applications.

Prof. Dr. Jiang Guo
Prof. Dr. Yebing Tian
Prof. Dr. Zhenzhong Wang
Prof. Dr. Jianguo Zhang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • optical precision processing technologies
  • ultra-precision machining technology
  • micro-nanostructure optics and manufacturing technologies

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Further information on MDPI's Special Issue polices can be found here.

Published Papers (1 paper)

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Research

13 pages, 2724 KiB  
Article
Reverse Design of Pixel-Type Micro-Polarizer Arrays to Improve Polarization Image Contrast
by Yonggui Shi, Zhihai Lin, Tianran Wang, Chaokai Huang, Hui Chen, Jianxiong Chen and Yu Xie
Micromachines 2024, 15(10), 1251; https://doi.org/10.3390/mi15101251 - 12 Oct 2024
Viewed by 681
Abstract
Micro-polarizer array (MPA) is the core optical component of the Division of Focal-Plane (DoFP) imaging system, and its design is very important to the system’s performance. Traditional design methods rely on theoretical analysis and simulation, which is complicated and requires designers to have [...] Read more.
Micro-polarizer array (MPA) is the core optical component of the Division of Focal-Plane (DoFP) imaging system, and its design is very important to the system’s performance. Traditional design methods rely on theoretical analysis and simulation, which is complicated and requires designers to have profound theoretical foundations. In order to simplify the design process and improve efficiency, this paper proposes a 2 × 2 MPA reverse-design strategy based on particle swarm optimization (PSO). This strategy uses intelligent algorithms to automatically explore the design space in order to discover MPA structures with optimal optical properties. In addition, the all-pass filter is introduced to the MPA superpixel unit in the design, which effectively reduces the crosstalk and frequency aliasing between pixels. In this study, two MPA models were designed: a traditional MPA and an MPA with an all-pass filter. The Degree of Linear Polarization (DOLP) image contrast is used as the evaluation standard and compared with the traditional MPA; the results show that the contrast of the newly designed traditional MPA image is increased by 21%, and the MPA image with the all-pass filter is significantly increased by 82%. Therefore, the reverse-design method proposed in this paper not only simplifies the design process but also can design an MPA with enhanced optical performance, which has obvious advantages over the traditional method. Full article
(This article belongs to the Special Issue Advanced Optical Manufacturing Technologies and Applications)
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