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Processes
Special Issues
Plasma Science and Plasma-Assisted Applications
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Plasma Science and Plasma-Assisted Applications

A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Chemical Processes and Systems".

Deadline for manuscript submissions: 30 May 2025 | Viewed by 2545

Special Issue Editors

Dr. Ying-Hao Liao

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Guest Editor
Dept. of Mechanical Engineering, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan
Interests: plasma technology; plasma-assisted combustion; space propulsion
Dr. Kun-Mo Lin

E-Mail Website
Guest Editor
Dept. of Mechanical Engineering, National Chung Cheng University, Chiayi 621301, Taiwan
Interests: application of plasma technology; plasma diagnostics/simulation; thermal/flow numerical simulation; high-performance parallel computing
Prof. Dr. Jian-Zhang Chen

E-Mail Website
Guest Editor
Graduate Institute of Applied Mechanics and Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
Interests: plasma technology on materials processing; solar cell; water splitting; hydrogen generation; supercapacitor; redox flow cell; fuel cell; battery; flexible electronics
Special Issues, Collections and Topics in MDPI journals
Dr. Katsuyuki Takahashi

E-Mail Website
Guest Editor
Faculty of Science and Engineering, Iwate University, Iwate 020-8551, Japan
Interests: pulsed power; high voltage; plasma; electrical discharge; bio-application
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Plasma science is a multidisciplinary field that explores the fundamental properties, behaviors and applications of plasmas. It encompasses various branches of physics, chemistry and engineering to study and understand the intricate nature of this highly ionized state of matter. The applications of plasma science span a wide range of fields, from energy and materials science to biomedicine and aerospace engineering. Plasma-assisted technologies have transformed industries such microelectronics, where plasma etching and deposition techniques are used for fabricating integrated circuits and other electronic devices.

Plasma science continues to evolve and expand, driven by ongoing research and technological advancements. As our understanding of plasmas deepens, new applications and innovations are being discovered, offering exciting possibilities for addressing challenges and advancing various scientific and technological frontiers. This Special Issue on “Plasma Science and Plasma-Assisted Applications” is aimed to focus on the recent developments and research on plasma physics, plasma chemistry, plasma technology and plasma applications in, but not limited to, energy, combustion, aerospace, biology, medicine, manufacturing, fluid mechanics and environmental science.

Dr. Ying-Hao Liao
Dr. Kun-Mo Lin
Prof. Dr. Jian-Zhang Chen
Dr. Katsuyuki Takahashi
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  •  plasma technology
  •  plasma physics
  •  plasma chemistry
  •  plasma applications
  •  plasma-assisted combustion
  •  plasma-treated water
  •  plasma coating
  •  plasma medicine
  •  plasma processing
  •  plasma diagnostics

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  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
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Further information on MDPI's Special Issue polices can be found here.

Published Papers (2 papers)

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Research

17 pages, 4486 KiB  
Article
Production of High-Power Nitrogen Sputtering Plasma for TiN Film Preparation
by Taishin Sato, Sawato Igarashi, Katsuyuki Takahashi, Seiji Mukaigawa and Koichi Takaki
Processes 2024, 12(7), 1314; https://doi.org/10.3390/pr12071314 - 25 Jun 2024
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Abstract
High-density nitrogen plasma was produced using a high-power pulsed power modulator to sputter titanium targets for the preparation of titanium nitride film. The high-power pulsed sputtering discharge unit consisted of two targets facing each other with the same electrical potential. The titanium target [...] Read more.
High-density nitrogen plasma was produced using a high-power pulsed power modulator to sputter titanium targets for the preparation of titanium nitride film. The high-power pulsed sputtering discharge unit consisted of two targets facing each other with the same electrical potential. The titanium target plates were used as target materials with dimensions of 60 mm length, 20 mm height, and 5 mm thickness. The gap length was set to be 10 mm. The magnetic field was created with a permanent magnet array behind the targets. The magnetic field strength at the gap between the target plates was 70 mT. The electrons were trapped by the magnetic and electric fields to enhance the ionization in the gap. The nitrogen and argon gases were injected into the chamber with 4 Pa gas pressure. The applied voltage to the target plates had an amplitude from −600 V to −1000 V with 600 μs in pulse width. The target current was approximately 10 A with the consumed power of 13 kW. The discharge sustaining voltage was almost constant and independent of the applied voltage, in the same manner as the conventional normal glow discharge. The ion density and electron temperature at the surface of the ionization region were obtained as 1.7 × 1019 m−3 and 3.4 eV, respectively, by the double probe measurements. The vertical distribution of ion density and electron temperature ranged from 1.1 × 1017 m−3 (at 6 cm from the target edge) to 1.7 × 1019 m−3 and from 2.4 eV (at 6 cm from the target edge) to 3.4 eV, respectively. From the emission spectra, the intensities of titanium atoms (Ti I), titanium ions (Ti II), and nitrogen ions (N2+) increased with increasing input power. However, the intensities ratio of Ti II to Ti I was not affected by the intensities from N2+. Full article
(This article belongs to the Special Issue Plasma Science and Plasma-Assisted Applications)
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15 pages, 8131 KiB  
Article
A Compact Microwave-Driven UV Lamp for Dental Light Curing
by Siyuan Liu, Yuqing Huang and Qinggong Guo
Processes 2023, 11(9), 2651; https://doi.org/10.3390/pr11092651 - 5 Sep 2023
Viewed by 1030
Abstract
The size of current microwave-driven UV lamps limits their direct application in dental light curing. This article proposes a coaxial structure to miniaturize the UV lamp. First, the Drude model and the finite difference time domain algorithm were used to analyze the multi-physical [...] Read more.
The size of current microwave-driven UV lamps limits their direct application in dental light curing. This article proposes a coaxial structure to miniaturize the UV lamp. First, the Drude model and the finite difference time domain algorithm were used to analyze the multi-physical field coupling and the complex field distribution within the lamp. Second, the dimensional parameters of the lamp were optimized, which enabled the lamp to be miniaturized and operate with high performance. Third, to analyze the sensitivity of the lamp, the effects of input power, gas pressure, and gas composition on its performance were investigated. It was found that an input power of 6 watts was enough to light the bulb with over 90% energy utilization. Finally, to verify the feasibility, an experimental system was set up. The lamp was successfully lit in the experiment, and its spectral output was tested. The results show that the microwave-driven UV lamp based on a coaxial structure is miniaturized and broad-spectrum, making it suitable for clinical dental light curing. Full article
(This article belongs to the Special Issue Plasma Science and Plasma-Assisted Applications)
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