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Editorial

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3 pages, 165 KiB

Open AccessEditorial

Special Issue “EUV and X-ray Wavefront Sensing”

by Mourad Idir, Daniele Cocco and Lei Huang

Sensors 2022, 22(10), 3940; https://doi.org/10.3390/s22103940 - 23 May 2022

Cited by 1 | Viewed by 1546

Abstract

X-ray optics are extensively used in synchrotron radiation and free-electron laser facilities, as well as in table-top laboratory sources [...] Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

Research

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19 pages, 6729 KiB

Open AccessArticle

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

by Ombeline de La Rochefoucauld, Guillaume Dovillaire, Fabrice Harms, Mourad Idir, Lei Huang, Xavier Levecq, Martin Piponnier and Philippe Zeitoun

Sensors 2021, 21(3), 874; https://doi.org/10.3390/s21030874 - 28 Jan 2021

Cited by 11 | Viewed by 5329

Abstract

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based [...] Read more.

For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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15 pages, 3015 KiB

Open AccessArticle

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

by Kenneth A. Goldberg, Antoine Wojdyla and Diane Bryant

Sensors 2021, 21(2), 536; https://doi.org/10.3390/s21020536 - 13 Jan 2021

Cited by 7 | Viewed by 2728

Abstract

New, high-coherent-flux X-ray beamlines at synchrotron and free-electron laser light sources rely on wavefront sensors to achieve and maintain optimal alignment under dynamic operating conditions. This includes feedback to adaptive X-ray optics. We describe the design and modeling of a new class of [...] Read more.

New, high-coherent-flux X-ray beamlines at synchrotron and free-electron laser light sources rely on wavefront sensors to achieve and maintain optimal alignment under dynamic operating conditions. This includes feedback to adaptive X-ray optics. We describe the design and modeling of a new class of binary-amplitude reflective gratings for shearing interferometry and Hartmann wavefront sensing. Compact arrays of deeply etched gratings illuminated at glancing incidence can withstand higher power densities than transmission membranes and can be designed to operate across a broad range of photon energies with a fixed grating-to-detector distance. Coherent wave-propagation is used to study the energy bandwidth of individual elements in an array and to set the design parameters. We observe that shearing operates well over a ±10% bandwidth, while Hartmann can be extended to ±30% or more, in our configuration. We apply this methodology to the design of a wavefront sensor for a soft X-ray beamline operating from 230 eV to 1400 eV and model shearing and Hartmann tests in the presence of varying wavefront aberration types and magnitudes. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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18 pages, 5810 KiB

Open AccessArticle

Quantitative X-ray Channel-Cut Crystal Diffraction Wavefront Metrology Using the Speckle Scanning Technique

by Lian Xue, Hongxin Luo, Qianshun Diao, Fugui Yang, Jie Wang and Zhongliang Li

Sensors 2020, 20(22), 6660; https://doi.org/10.3390/s20226660 - 20 Nov 2020

Cited by 4 | Viewed by 2718

Abstract

A speckle-based method for the X-ray crystal diffraction wavefront measurement is implemented, and the slope errors of channel-cut crystals with different surface characteristics are measured. The method uses a speckle scanning technique generated by a scattering membrane translated using a piezo motor to [...] Read more.

A speckle-based method for the X-ray crystal diffraction wavefront measurement is implemented, and the slope errors of channel-cut crystals with different surface characteristics are measured. The method uses a speckle scanning technique generated by a scattering membrane translated using a piezo motor to infer the deflection of X-rays from the crystals. The method provides a high angular sensitivity of the channel-cut crystal slopes in both the tangential and sagittal directions. The experimental results show that the slope error of different cutting and etching processes ranges from 0.25 to 2.98 μrad. Furthermore, the results of wavefront deformation are brought into the beamline for simulation. This method opens up possibilities for new high-resolution applications for X-ray crystal diffraction wavefront measurement and provides feedback to crystal manufacturers to improve channel-cut fabrication. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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Other

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11 pages, 3193 KiB

Open AccessLetter

X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors

by Jumpei Yamada, Takato Inoue, Nami Nakamura, Takashi Kameshima, Kazuto Yamauchi, Satoshi Matsuyama and Makina Yabashi

Sensors 2020, 20(24), 7356; https://doi.org/10.3390/s20247356 - 21 Dec 2020

Cited by 10 | Viewed by 4325

Abstract

X-ray single-grating interferometry was applied to conduct accurate wavefront corrections for hard X-ray nanofocusing mirrors. Systematic errors in the interferometer, originating from a grating, a detector, and alignment errors of the components, were carefully examined. Based on the measured wavefront errors, the mirror [...] Read more.

X-ray single-grating interferometry was applied to conduct accurate wavefront corrections for hard X-ray nanofocusing mirrors. Systematic errors in the interferometer, originating from a grating, a detector, and alignment errors of the components, were carefully examined. Based on the measured wavefront errors, the mirror shapes were directly corrected using a differential deposition technique. The corrected X-ray focusing mirrors with a numerical aperture of 0.01 attained two-dimensionally diffraction-limited performance. The results of the correction indicate that the uncertainty of the wavefront measurement was less than λ/72 in root-mean-square value. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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11 pages, 8171 KiB

Open AccessLetter

Simulation of Fresnel Zone Plate Imaging Performance with Number of Zones

by Ying Li, Ombeline de La Rochefoucauld and Philippe Zeitoun

Sensors 2020, 20(22), 6649; https://doi.org/10.3390/s20226649 - 20 Nov 2020

Cited by 5 | Viewed by 4512

Abstract

In recent years, integral imaging, a promising three-dimensional imaging technology, has attracted more and more attention for its broad applications in robotics, computational vision, and medical diagnostics. In the visible spectrum, an integral imaging system can be easily implemented by inserting a micro-lens [...] Read more.

In recent years, integral imaging, a promising three-dimensional imaging technology, has attracted more and more attention for its broad applications in robotics, computational vision, and medical diagnostics. In the visible spectrum, an integral imaging system can be easily implemented by inserting a micro-lens array between a image formation optic and a pixelated detector. By using a micro-Fresnel Zone Plate (FZP) array instead of the refractive lens array, the integral imaging system can be applied in X-ray. Due to micro-scale dimensions of FZP in the array and current manufacturing techniques, the number of zones of FZP is limited. This may have an important impact on the FZP imaging performance. The paper introduces a simulation method based on the scalar diffraction theory. With the aid of this method, the effect of the number of zones on the FZP imaging performance is numerically investigated, especially the case of very small number of zones. Results of several simulation of FZP imaging are presented and show the image can be formed by a FZP with a number of zones as low as 5. The paper aims at offering a numerical approach in order to facilitate the design of FZP for integral imaging. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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13 pages, 3094 KiB

Open AccessLetter

Modelling of Phase Contrast Imaging with X-ray Wavefront Sensor and Partial Coherence Beams

by Ginevra Begani Provinciali, Alessia Cedola, Ombeline de La Rochefoucauld and Philippe Zeitoun

Sensors 2020, 20(22), 6469; https://doi.org/10.3390/s20226469 - 12 Nov 2020

Cited by 5 | Viewed by 3206

Abstract

The Hartmann wavefront sensor is able to measure, separately and in absolute, the real δ and imaginary part β of the X-ray refractive index. While combined with tomographic setup, the Hartman sensor opens many interesting opportunities behind the direct measurement of the material [...] Read more.

The Hartmann wavefront sensor is able to measure, separately and in absolute, the real δ and imaginary part β of the X-ray refractive index. While combined with tomographic setup, the Hartman sensor opens many interesting opportunities behind the direct measurement of the material density. In order to handle the different ways of using an X-ray wavefront sensor in imaging, we developed a 3D wave propagation model based on Fresnel propagator. The model can manage any degree of spatial coherence of the source, thus enabling us to model experiments accurately using tabletop, synchrotron or X-ray free-electron lasers. Beam divergence is described in a physical manner consistent with the spatial coherence. Since the Hartmann sensor can detect phase and absorption variation with high sensitivity, a precise simulation tool is thus needed to optimize the experimental parameters. Examples are displayed. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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9 pages, 1213 KiB

Open AccessLetter

Metrology of a Focusing Capillary Using Optical Ptychography

by Xiaojing Huang, Evgeny Nazaretski, Weihe Xu, Dean Hidas, Mark Cordier, Benjamin Stripe, Wenbing Yun and Yong S. Chu

Sensors 2020, 20(22), 6462; https://doi.org/10.3390/s20226462 - 12 Nov 2020

Cited by 3 | Viewed by 2149

Abstract

The focusing property of an ellipsoidal monocapillary has been characterized using the ptychography method with a 405 nm laser beam. The recovered wavefront gives a

12.5 \times 10.4

μ

m

^{2}

focus. The reconstructed phase profile of the focused beam can be used [...] Read more.

The focusing property of an ellipsoidal monocapillary has been characterized using the ptychography method with a 405 nm laser beam. The recovered wavefront gives a

12.5 \times 10.4

μ

m

^{2}

focus. The reconstructed phase profile of the focused beam can be used to estimate the height error of the capillary surface. The obtained height error shows a Gaussian distribution with a standard deviation of 1.3

μ

m. This approach can be used as a quantitative tool for evaluating the inner functional surfaces of reflective optics, complementary to conventional metrology methods. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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13 pages, 4190 KiB

Open AccessLetter

Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

by Mabel Ruiz-Lopez, Masoud Mehrjoo, Barbara Keitel, Elke Plönjes, Domenico Alj, Guillaume Dovillaire, Lu Li and Philippe Zeitoun

Sensors 2020, 20(22), 6426; https://doi.org/10.3390/s20226426 - 10 Nov 2020

Cited by 6 | Viewed by 3804

Abstract

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical [...] Read more.

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy. Full article

(This article belongs to the Special Issue EUV and X-ray Wavefront Sensing)

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