The surface structure and adjacent interior of commercially available silicon nanopowder (
np-Si) was studied using multinuclear, solid-state NMR spectroscopy. The results are consistent with an overall picture in which the bulk of the
np-Si
interior consists of highly ordered (“crystalline”)
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The surface structure and adjacent interior of commercially available silicon nanopowder (
np-Si) was studied using multinuclear, solid-state NMR spectroscopy. The results are consistent with an overall picture in which the bulk of the
np-Si
interior consists of highly ordered (“crystalline”) silicon atoms, each bound tetrahedrally to four other silicon atoms. From a combination of
1H,
29Si and
2H magic-angle-spinning (MAS) NMR results and quantum mechanical
29Si chemical shift calculations, silicon atoms on the
surface of “as-received”
np-Si were found to exist in a variety of chemical structures, with apparent populations in the order (a) (
Si–O–)
3Si–H > (b) (
Si–O–)
3SiOH > (c) (HO–)
nSi(
Si)
m(–O
Si)
4−m−n ≈ (d) (
Si–O–)
2Si(H)OH > (e) (
Si–O–)
2Si(–OH)
2 > (f) (
Si–O–)
4Si, where
Si stands for a surface silicon atom and
Si represents another silicon atom that is attached to
Si by either a
Si–
Si bond or a
Si–O–
Si linkage. The relative populations of each of these structures can be modified by chemical treatment, including with O
2 gas at elevated temperature. A deliberately oxidized sample displays an increased population of (
Si–O–)
3Si–H, as well as (
Si–O–)
3SiOH sites. Considerable heterogeneity of some surface structures was observed. A combination of
1H and
2H MAS experiments provide evidence for a substantial population of silanol (
Si–OH) moieties, some of which are not readily H-exchangeable, along with the dominant
Si–H sites, on the surface of “as-received”
np-Si; the silanol moieties are enhanced by deliberate oxidation. An extension of the DEPTH background suppression method is also demonstrated that permits measurement of the T
2 relaxation parameter simultaneously with background suppression.
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