Article Versions Notes

Meng X, Byun Y-C, Kim HS, Lee JS, Lucero AT, Cheng L, Kim J. Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks. Materials. 2016; 9(12):1007. https://doi.org/10.3390/ma9121007

Meng, Xin, Young-Chul Byun, Harrison S. Kim, Joy S. Lee, Antonio T. Lucero, Lanxia Cheng, and Jiyoung Kim. 2016. "Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks" Materials 9, no. 12: 1007. https://doi.org/10.3390/ma9121007

Meng, X., Byun, Y. -C., Kim, H. S., Lee, J. S., Lucero, A. T., Cheng, L., & Kim, J. (2016). Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks. Materials, 9(12), 1007. https://doi.org/10.3390/ma9121007