Selective Photophysical Modification on Light-Emitting Polymer Films for Micro- and Nano-Patterning
Abstract
:1. Introduction
2. Laser-Induced Cross-Linking in Polymer Film
3. Spatial Selectivity in Laser-Induced Cross-Linking
3.1. Single- and Two-Photon-Induced Cross-Linking Processes
3.2. Interference Cross-Linking with High Spatial Resolution
4. Phase-Selective Laser-Induced Cross-Linking in Polymer Blends for Plasmonic Patterning
4.1. Selective Cross-Linking of the Phase-Separation Scheme of a Polymer-Blend Film
4.2. Metallization of the Selectively Cross-Linked Phase-Separation Pattern
5. Conclusions
Acknowledgments
Author Contributions
Conflicts of Interest
References
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Zhang, X.; Liu, F.; Li, H. Selective Photophysical Modification on Light-Emitting Polymer Films for Micro- and Nano-Patterning. Materials 2016, 9, 121. https://doi.org/10.3390/ma9030121
Zhang X, Liu F, Li H. Selective Photophysical Modification on Light-Emitting Polymer Films for Micro- and Nano-Patterning. Materials. 2016; 9(3):121. https://doi.org/10.3390/ma9030121
Chicago/Turabian StyleZhang, Xinping, Feifei Liu, and Hongwei Li. 2016. "Selective Photophysical Modification on Light-Emitting Polymer Films for Micro- and Nano-Patterning" Materials 9, no. 3: 121. https://doi.org/10.3390/ma9030121
APA StyleZhang, X., Liu, F., & Li, H. (2016). Selective Photophysical Modification on Light-Emitting Polymer Films for Micro- and Nano-Patterning. Materials, 9(3), 121. https://doi.org/10.3390/ma9030121