Defocus Effect Correction for Back Focal Plane Ellipsometry for Antivibration Measurement of Thin Films
Round 1
Reviewer 1 Report
The manuscript is interesting, original and well presented. I recommend the mention MINNOR ERRORS. I list below my comments:
1. Page 2, Eq (1) and Figure 1: please can you explain how is it possible to measure the ellipsometric angles using one polarizer and one analyzer?
2. Page 2, Eq (2): can you please define all the parameters in the equation 2?
3. Page3, line 114: Please check the Abbe's equation.
4. Page 4, line 139: what's the importance of choosing a thick glass plate?
5. Page 5, line 197 and Page 6, line 224: please define Fp used in page 6. Is it the focal point in the page 5, line 197?
6. Page 7, Figure 6: please put the title on the bottom of Figure.
7. Page 8, Figure 7: it is noted psi (min)=835.65. Please revise as RB=835.65.
8. Page 4, 3.2 part, Eq (7) and page 7 and 8: can the authors explain the origin of the ellipsometric parameters error compensation amount. Furthermore, can these two parameters be calibrated with material other than the SiO2 thin film layer?
Author Response
Please see the attachment.
Author Response File: 
Author Response.docx
Reviewer 2 Report
Defocus‐Effect Correction for Back‐Focal‐Plane Ellipsometry for Anti‐Vibration Measurement of Thin Films
The present manuscript describes a proposed method for thin film characterization, where thin films play an important role in the manufacturing of semiconductors and display electronics. One of the major problems in the thin film industry is determining accurately the optical thickness and refractive index of the deposited films. These methods include spectrophotometric techniques, channelled spectra techniques, and ellipsometric techniques. Ellipsometry, which is widely used due to its rapidity, non-destructiveness, and high precision of measurement, is based on monitoring the variation of the state of polarization of the reflected electromagnetic wave upon reflection from a thin film under investigation. After that, the change in the state of polarization of the reflected light is directly related to the optical properties of the films under investigation.
Ellipsometry measurements depend on changing the angle of incidence through a mechanical system (goniometer), so any vibrations would result in signal distortion problems in the ellipsometric measurements and consequent variation in the optical parameters of the investigated film. Therefore, a method to overcome the vibration-induced measurement distortion in thin film online inspection is urgently needed. One of the questions about the calibration and compensation method is whether this method can be used on single-wavelength or spectroscopic ellipsometry equipment.
· One of the questions about the Defocus effect calibration and compensation method can this method be used on single wavelength or spectroscopic ellipsometry equipment’s.
· What is the effects of the calibration and compensation method for the case of rotating compensator Ellipsometry configuration?
· SiO2 is very well known sample, did the The author apply their method on apply to another sample?
· More up to date references could improve the manuscript.
In conclusion, I recommend accepting the manuscript for publication after the addressing the above minor points.
Author Response
Please see the attachment.
Author Response File: Author Response.docx
