State-of-the-Art of Optical Micro/Nano-Metrology and Instrumentation
A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Optics and Lasers".
Deadline for manuscript submissions: closed (30 November 2022) | Viewed by 31566
Special Issue Editors
Interests: optical nanometrology; ellipsometry and polarimetry; scatterometry
Special Issues, Collections and Topics in MDPI journals
Interests: optical nanometrology; optical frequency comb; Lidar
Special Issues, Collections and Topics in MDPI journals
Interests: dimensional metrology; optical metrology; precision positioning; tribology
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
Optical metrology plays an important role in today’s manufacturing industry. Many optical measurement technologies have been developed and employed in state-of-the-art manufacturing processes due to their contactless, non-destructive and high measurement-throughput merits. Optical metrology is a huge topic that involves different measurement principles, different measurement objects, and different fields of applications, by exploring the inherent characteristics of light, such as amplitude (intensity), phase, polarization, and spectrum.
State-of-the-art optical micro/nano-metrology in the manufacturing industry can be classified into two groups according to their main uses: those used for precision positioning, such as all kinds of optical sensors for linear and angular displacement measurement, and those used for quality assessment of products, such as interferometry, deflectometry, diffractometry and scatterometry for surface form or texture measurement, as well as optical coherence tomography for internal structure inspection.
This Special Issue welcomes any papers about state-of-art optical micro/nano-metrology and instrumentation for precision positioning or quality assessment of products in manufacturing processes. The recent progress revealing novel optical measurement technologies and instrumentations in dealing with the new requirements and challenges with the advent of new processing technologies is also expected in this Special Issue.
Prof. Dr. Xiuguo Chen
Dr. Guanhao Wu
Prof. Dr. Yuki Shimizu
Guest Editors
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Keywords
- optical metrology
- interferometry
- deflectometry
- diffractometry
- scatterometry
- confocal microscopy
- optical coherence tomography
- optical sensor
- optical measuring instruments
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