Bonomo, M.; Di Girolamo, D.; Piccinni, M.; Dowling, D.P.; Dini, D.
Electrochemically Deposited NiO Films as a Blocking Layer in p-Type Dye-Sensitized Solar Cells with an Impressive 45% Fill Factor. Nanomaterials 2020, 10, 167.
https://doi.org/10.3390/nano10010167
AMA Style
Bonomo M, Di Girolamo D, Piccinni M, Dowling DP, Dini D.
Electrochemically Deposited NiO Films as a Blocking Layer in p-Type Dye-Sensitized Solar Cells with an Impressive 45% Fill Factor. Nanomaterials. 2020; 10(1):167.
https://doi.org/10.3390/nano10010167
Chicago/Turabian Style
Bonomo, Matteo, Diego Di Girolamo, Marco Piccinni, Denis P. Dowling, and Danilo Dini.
2020. "Electrochemically Deposited NiO Films as a Blocking Layer in p-Type Dye-Sensitized Solar Cells with an Impressive 45% Fill Factor" Nanomaterials 10, no. 1: 167.
https://doi.org/10.3390/nano10010167
APA Style
Bonomo, M., Di Girolamo, D., Piccinni, M., Dowling, D. P., & Dini, D.
(2020). Electrochemically Deposited NiO Films as a Blocking Layer in p-Type Dye-Sensitized Solar Cells with an Impressive 45% Fill Factor. Nanomaterials, 10(1), 167.
https://doi.org/10.3390/nano10010167