Kersting, E.; Babin, H.-G.; Spitzer, N.; Yan, J.-Y.; Liu, F.; Wieck, A.D.; Ludwig, A.
Shutter-Synchronized Molecular Beam Epitaxy for Wafer-Scale Homogeneous GaAs and Telecom Wavelength Quantum Emitter Growth. Nanomaterials 2025, 15, 157.
https://doi.org/10.3390/nano15030157
AMA Style
Kersting E, Babin H-G, Spitzer N, Yan J-Y, Liu F, Wieck AD, Ludwig A.
Shutter-Synchronized Molecular Beam Epitaxy for Wafer-Scale Homogeneous GaAs and Telecom Wavelength Quantum Emitter Growth. Nanomaterials. 2025; 15(3):157.
https://doi.org/10.3390/nano15030157
Chicago/Turabian Style
Kersting, Elias, Hans-Georg Babin, Nikolai Spitzer, Jun-Yong Yan, Feng Liu, Andreas D. Wieck, and Arne Ludwig.
2025. "Shutter-Synchronized Molecular Beam Epitaxy for Wafer-Scale Homogeneous GaAs and Telecom Wavelength Quantum Emitter Growth" Nanomaterials 15, no. 3: 157.
https://doi.org/10.3390/nano15030157
APA Style
Kersting, E., Babin, H.-G., Spitzer, N., Yan, J.-Y., Liu, F., Wieck, A. D., & Ludwig, A.
(2025). Shutter-Synchronized Molecular Beam Epitaxy for Wafer-Scale Homogeneous GaAs and Telecom Wavelength Quantum Emitter Growth. Nanomaterials, 15(3), 157.
https://doi.org/10.3390/nano15030157