Zhang, C.; Dyck, O.; Garfinkel, D.A.; Stanford, M.G.; Belianinov, A.A.; Fowlkes, J.D.; Jesse, S.; Rack, P.D.
Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394.
https://doi.org/10.3390/nano9101394
AMA Style
Zhang C, Dyck O, Garfinkel DA, Stanford MG, Belianinov AA, Fowlkes JD, Jesse S, Rack PD.
Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials. 2019; 9(10):1394.
https://doi.org/10.3390/nano9101394
Chicago/Turabian Style
Zhang, Cheng, Ondrej Dyck, David A. Garfinkel, Michael G. Stanford, Alex A. Belianinov, Jason D. Fowlkes, Stephen Jesse, and Philip D. Rack.
2019. "Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns" Nanomaterials 9, no. 10: 1394.
https://doi.org/10.3390/nano9101394
APA Style
Zhang, C., Dyck, O., Garfinkel, D. A., Stanford, M. G., Belianinov, A. A., Fowlkes, J. D., Jesse, S., & Rack, P. D.
(2019). Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials, 9(10), 1394.
https://doi.org/10.3390/nano9101394