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Article Versions Notes

Inorganics 2023, 11(12), 477; https://doi.org/10.3390/inorganics11120477

Action	Date	Notes	Link
article xml file uploaded	14 December 2023 05:36 CET	Original file	-
article xml uploaded.	14 December 2023 05:36 CET	Update	https://www.mdpi.com/2304-6740/11/12/477/xml
article pdf uploaded.	14 December 2023 05:36 CET	Version of Record	https://www.mdpi.com/2304-6740/11/12/477/pdf
article html file updated	14 December 2023 05:38 CET	Original file	https://www.mdpi.com/2304-6740/11/12/477/html

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MDPI and ACS Style

Morales, C.; Mahmoodinezhad, A.; Tschammer, R.; Kosto, J.; Alvarado Chavarin, C.; Schubert, M.A.; Wenger, C.; Henkel, K.; Flege, J.I. Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates. Inorganics 2023, 11, 477. https://doi.org/10.3390/inorganics11120477

AMA Style

Morales C, Mahmoodinezhad A, Tschammer R, Kosto J, Alvarado Chavarin C, Schubert MA, Wenger C, Henkel K, Flege JI. Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates. Inorganics. 2023; 11(12):477. https://doi.org/10.3390/inorganics11120477

Chicago/Turabian Style

Morales, Carlos, Ali Mahmoodinezhad, Rudi Tschammer, Julia Kosto, Carlos Alvarado Chavarin, Markus Andreas Schubert, Christian Wenger, Karsten Henkel, and Jan Ingo Flege. 2023. "Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates" Inorganics 11, no. 12: 477. https://doi.org/10.3390/inorganics11120477

APA Style

Morales, C., Mahmoodinezhad, A., Tschammer, R., Kosto, J., Alvarado Chavarin, C., Schubert, M. A., Wenger, C., Henkel, K., & Flege, J. I. (2023). Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al₂O₃ Films on Metallic Ti Substrates. Inorganics, 11(12), 477. https://doi.org/10.3390/inorganics11120477

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