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Plasma Techniques: Theory, Methods and Applications

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Applied Physics General".

Deadline for manuscript submissions: closed (31 December 2022) | Viewed by 2172

Special Issue Editor


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Guest Editor
Institute of Fluid Flow Machinery, Polish Academy of Sciences, Fiszera 14, 80-231 Gdansk, Poland
Interests: development of microwave plasma sources; plasma diagnostics; applications of atmospheric pressure microwave plasmas; application of microwave plasma sources for hydrogen production; application of microwave plasma sources for destruction of harmful gases; application of microwave plasma for treatment of materials
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Special Issue Information

Dear Colleagues,

This Special Issue titled "Plasma Techniques: Theory, Methods, and Applications" of the journal Applied Sciences aims to provide a description of theory, methods, devices, processes, and applications related to plasma science and engineering. Plasma is called the fourth state of matter because its properties differ significantly from those of ordinary gas. Plasma can be determined as a conductive medium generated by the ionization of gases. Thus, it occurs as a mixture of photons, electrons, and ions, but it can also contain neutral atoms and molecules. The concept of plasma includes media with very different properties because the composition, densities, and kinetic energies of plasma components differ for various types of plasma by several or even more orders of magnitude. This Special Issue aims to showcase advances in plasma techniques for all existing areas of science and technology.

Kind regards,

Dr. Mariusz Jasiński
Guest Editor

Manuscript Submission Information

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Keywords

  • equilibrium (thermal) plasma
  • non-equilibrium (nonthermal) plasma
  • low-pressure plasma
  • atmospheric pressure plasma
  • plasma applications
  • plasma theory and modeling
  • plasma sources
  • plasma diagnostic methods

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Published Papers (1 paper)

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Research

10 pages, 3164 KiB  
Article
One-Body Capillary Plasma Source for Plasma Accelerator Research at e-LABs
by Sihyeon Lee, Seong-hoon Kwon, Inhyuk Nam, Myung-Hoon Cho, Dogeun Jang, Hyyong Suk and Minseok Kim
Appl. Sci. 2023, 13(4), 2564; https://doi.org/10.3390/app13042564 - 16 Feb 2023
Viewed by 1778
Abstract
We report on the development of a compact, gas-filled capillary plasma source for plasma accelerator applications. The one-body sapphire capillary was created through a diamond machining technique, which enabled a straightforward and efficient manufacturing process. The effectiveness of the capillary as a plasma [...] Read more.
We report on the development of a compact, gas-filled capillary plasma source for plasma accelerator applications. The one-body sapphire capillary was created through a diamond machining technique, which enabled a straightforward and efficient manufacturing process. The effectiveness of the capillary as a plasma acceleration source was investigated through laser wakefield acceleration experiments with a helium-filled gas cell, resulting in the production of stable electron beams of 200 MeV. Discharge capillary plasma was generated using a pulsed, high-voltage system for potential use as an active plasma lens. A peak current of 140 A, corresponding to a focusing gradient of 97 T/m, was observed at a voltage of 10 kV. These results demonstrate the potential utility of the developed capillary plasma source in plasma accelerator research using electron beams from a photocathode gun. Full article
(This article belongs to the Special Issue Plasma Techniques: Theory, Methods and Applications)
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