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Application of Advanced Plasma Technology in Coatings, Films and Etching
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Application of Advanced Plasma Technology in Coatings, Films and Etching

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Plasma Coatings, Surfaces & Interfaces".

Deadline for manuscript submissions: closed (20 September 2024) | Viewed by 8444

Special Issue Editor

Dr. Shih-Nan Hsiao

E-Mail Website
Guest Editor
Center for Low-Temperature Plasma Sciences, Nagoya University, Nagoya 464-8603, Japan
Interests: plasma etching (high-aspect ratio contact etching, atomic-layer etching and low-temperature etching); plasma diagnositics and simulation; magnetic materials (permanet hard magnetic thin films, recording media and exchange bias); X-ray based techniques (synchotron radiation, X-ray diffraction, X-ray reflectivity, X-ray absorption and X-ray photoemission spectroscopy); thin-film stress; surface finishing for anticorrosion
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Plasma techniques have revolutionized the fields of materials science, enabling coatings, films and etching in a wide range of areas in surface engineering. The advanced plasma techniques have greatly contributed to the field of nanofabrication by allowing the precise control of nano-scale materials. With these plasma-based techniques, it is possible to deposite or etch thin films of various nano-scale materials for applications of nanoelectronics, photovoltaic and biosensors. Spurred primarily by the growing applications ranging from advanced logic devices, flash memory and magnetoresistive random access memory, nano-electromechanical systems, energy devices, etc., new processes, instruments, diagnostic techniques, and deposition and etching mechanisms are required. Accordingly, we are launching this Special Issue of Coatings that will focus on the fundamentals and applications of advanced plasma techniques for coating, films and etching in addressing the covered subjects.

This Special Issue will collect original research articles and review papers that include, but are not limited to, the following areas:

  • Theoretical, modeling and experimental research, knowledge and new ideas in plasma source, pulsed plasma techniques and radiation sources;
  • Atomic layer processing (ALD/ALE);
  • Dry etching technologies with low-pressure and atmospheric plasmas;
  • Plasma deposition of functional coatings and finishings;
  • High-pressure and thermal plasma processing;
  • Surface reaction and damage with plasma;
  • Nanofabrication and nanodevices using plasma-based techniques;
  • Plasma processing for biomaterial, medical, energy and sensor applications;
  • Plasma processing for new material devices (MRAM, power devices, organics, etc.).

Dr. Shih-Nan Hsiao
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • advanced plasma process for coatings
  • atomic layer etching and high-aspect ratio contact etching
  • plasma-induced damage
  • plasma diagnostics
  • etching modeling

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Further information on MDPI's Special Issue polices can be found here.

Published Papers (7 papers)

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Research

13 pages, 7529 KiB  
Article
Ammonia Plasma Surface Treatment for Enhanced Cu–Cu Bonding Reliability for Advanced Packaging Interconnection
by Ho Jeong Jeon and Sang Jeen Hong
Coatings 2024, 14(11), 1449; https://doi.org/10.3390/coatings14111449 - 14 Nov 2024
Viewed by 394
Abstract
With the emergence of 3D stacked semiconductor products, such as high-bandwidth memory, bonding-interface reliability cannot be overemphasized. The condition of the surface interface before bonding is important and can substantially affect product reliability. Plasma technology can be used to control the state of [...] Read more.
With the emergence of 3D stacked semiconductor products, such as high-bandwidth memory, bonding-interface reliability cannot be overemphasized. The condition of the surface interface before bonding is important and can substantially affect product reliability. Plasma technology can be used to control the state of a bonding interface, but various factors of interest, such as surface roughness, chemical bonding state, and surface cleanliness, may depend on the type of gaseous plasma. These factors may increase voids at the interface, which can jeopardize the product reliability. In this study, NH3 plasma surface treatment is investigated and compared with the conventionally preferred surface treatment under Ar plasma. Under the latter method, specific anomalies occurred and led to void formation at the interface during bonding. By contrast, NH3 plasma treatment maintained higher uniformity, higher overall surface conditions, and a smooth reduction process. Furthermore, the formation of a nitride passivation layer effectively inhibited the oxidation of the metal surface, and the flat surface resulted in the decrease in voids compared with the Ar plasma treatment after the copper–copper bonding. From the experimental analysis, we achieved a 12% reduction in resistance in the samples treated with NH3 plasma treatment due to the suppression of surface oxidation. However, it is unfortunate that the shear strength in the experimental samples treated with NH3 plasma treatment needs to be further improved. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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20 pages, 19859 KiB  
Article
The Influence of the Plasma Electrolytic Oxidation Parameters of the Mg-AZ31B Alloy on the Micromechanical and Sclerometric Properties of Oxide Coatings
by Mateusz Niedźwiedź, Marek Bara, Joanna Korzekwa, Adrian Barylski and Sławomir Kaptacz
Coatings 2024, 14(11), 1446; https://doi.org/10.3390/coatings14111446 - 13 Nov 2024
Viewed by 393
Abstract
This manuscript presents the influence of manufacturing process parameters (peak current density, frequency, process time) on the micromechanical and sclerometric properties of oxide coatings. These parameters were selected based on Hartley’s experimental design, considering three variables at three levels. The coatings were produced [...] Read more.
This manuscript presents the influence of manufacturing process parameters (peak current density, frequency, process time) on the micromechanical and sclerometric properties of oxide coatings. These parameters were selected based on Hartley’s experimental design, considering three variables at three levels. The coatings were produced on the AZ31B magnesium alloy using the plasma electrolytic oxidation (PEO) method. A trapezoidal voltage waveform and an alkaline, two-component electrolyte were used during the process. The micromechanical and sclerometric properties were assessed by measuring the hardness (HIT) and Young’s modulus (EIT) and determining three critical loads: Lc1 (the critical load at which the first coating damage occurred—Hertz tensile cracks within the scratch), Lc2 (the critical load causing the first cohesive damage to the coating), and Lc3 (the load at which the coating was completely destroyed). Scratch tests were supplemented with profilographometric measurements, which were used to generate isometric images. To identify the relationship between micromechanical and sclerometric properties and the manufacturing parameters, statistical analysis was performed. Research has demonstrated that the plasma electrolytic oxidation (PEO) process improves the micromechanical and adhesive properties of oxide coatings on the AZ31B magnesium alloy. The key process parameters, including peak current density, frequency, and duration, are crucial in determining these enhanced properties. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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12 pages, 6042 KiB  
Article
Influence of Flow Rates and Flow Times of Plasma-Enhanced Atomic Layer Deposition Purge Gas on TiN Thin Film Properties
by Ju Eun Kang, Surin An and Sang Jeen Hong
Coatings 2024, 14(6), 673; https://doi.org/10.3390/coatings14060673 - 27 May 2024
Viewed by 1199
Abstract
This study investigated the effect of purge gas flow rate and purge gas flow time on the properties of TiN thin films via chemical reaction simulation and the plasma-enhanced atomic layer deposition (PEALD) process along purge gas flow rates and time settings. Chemical [...] Read more.
This study investigated the effect of purge gas flow rate and purge gas flow time on the properties of TiN thin films via chemical reaction simulation and the plasma-enhanced atomic layer deposition (PEALD) process along purge gas flow rates and time settings. Chemical reaction simulation unveiled an incremental increase in generating volatile products along purge gas flow rates. In contrast, increased purge gas flow times enhanced the desorption of physically adsorbed species flow time in the film surface. Subsequent thin film analysis showed that the increased Ar purge gas flow rate caused a shift of 44% in wafer non-uniformity, 46% in carbon composition, and 11% in oxygen composition in the deposited film. Modulations in the Ar purge gas flow time yielded variations of 50% in wafer non-uniformity, 46% in carbon composition, and 15% in oxygen content. Notably, 38% of the resistivity and 35% of the film thickness occurred due to experimental variations in the Ar purge step condition. Increased purge gas flow rates had a negligible impact on the film composition, thickness, and resistivity, but the film’s non-uniformity on a 6-inch wafer was notable. Extended purge gas flow times with inadequate flow rates resulted in undesired impurities in the thin film. This study employed a method that utilized reaction simulation to investigate the impact of purge gas flow and verified these results through film properties analysis. These findings can help in determining optimal purge conditions to achieve the desired film properties of PEALD-deposited TiN thin films. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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8 pages, 2444 KiB  
Article
Oxidation and Heat Shock Resistance of Plasma-Sprayed TiC-CoNi Composite Coatings at 900 °C
by Jining He, Baoqiang Li, Hongjian Zhao, Guanya Fu, Jiawei Fan and Yanfang Qin
Coatings 2024, 14(3), 296; https://doi.org/10.3390/coatings14030296 - 28 Feb 2024
Viewed by 1038
Abstract
In this work, the TiC-reinforced CoNi alloy coatings were prepared by the plasma spraying method. Their microstructure, high-temperature oxidation, and thermal shock resistance at 900 °C were studied. The results showed that the CoNi alloy coating exhibited a single phase (c-Co-Ni-Cr-Mo). After adding [...] Read more.
In this work, the TiC-reinforced CoNi alloy coatings were prepared by the plasma spraying method. Their microstructure, high-temperature oxidation, and thermal shock resistance at 900 °C were studied. The results showed that the CoNi alloy coating exhibited a single phase (c-Co-Ni-Cr-Mo). After adding Ti-graphite mixed powders, the sprayed coating exhibited TiC and TiO2 phases, besides the c-Co-Ni-Cr-Mo matrix phase. For CoNi alloy coating, the main oxidation products were Cr2O3 and CoCr2O4 (NiCr2O4). For TiC-CoNi alloy coating, the main oxidation products were the TiO2 phase, coupled with Cr2O3 and CoCr2O4 (NiCr2O4) phases. The content of oxides increased with the oxidation time. The oxidation weight gain of the TiC-CoNi composite coating was slightly higher than that of the CoNi alloy coating. The formation of TiC could improve the thermal shock resistance of the CoNi alloy coating. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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11 pages, 3323 KiB  
Article
Influence of the Annealing Environment on the Structure and Ferroelectric Properties of Lead Titanate Thin Films
by Aleksandras Iljinas, Vytautas Stankus and Liutauras Marcinauskas
Coatings 2024, 14(1), 58; https://doi.org/10.3390/coatings14010058 - 30 Dec 2023
Viewed by 1230
Abstract
Lead titanate thin films of pyrochlore phase were deposited using layer-by-layer reactive magnetron sputtering on a heated platinized silicon substrate. It was found that the pyrochlore phase transition to the perovskite phase was initiated at 700 °C, and the properties of the PbTiO [...] Read more.
Lead titanate thin films of pyrochlore phase were deposited using layer-by-layer reactive magnetron sputtering on a heated platinized silicon substrate. It was found that the pyrochlore phase transition to the perovskite phase was initiated at 700 °C, and the properties of the PbTiO3 films could be controlled by changing the annealing environment. The thin films annealed in air and oxygen environments (1.33 Pa) have a tetragonal structure. The highest values of remnant polarization and the coercive field were 38 μC/cm2 and 130 kV/cm, respectively, but the largest dielectric loss was determined for the films annealed in air. The remnant polarization, coercive field and dielectric loss were reduced when the annealing of films was performed using oxygen gas at 1.33 Pa pressure. The films annealed in vacuum showed a rhombohedral (and ferroelectric) structure with the lowest remnant polarization and coercive field values. Such a structure was not observed for lead titanate at room temperature. It was observed that the surface morphology strongly depended on the reaction rate, which was influenced by the oxygen concentration in the environment. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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17 pages, 7995 KiB  
Article
High-Power Impulse Magnetron Sputter-Deposited Chromium-Based Coatings for Corrosion Protection
by Yen-Chun Liu, Shih-Nan Hsiao, Ying-Hung Chen, Ping-Yen Hsieh and Ju-Liang He
Coatings 2023, 13(12), 2101; https://doi.org/10.3390/coatings13122101 - 18 Dec 2023
Cited by 3 | Viewed by 1703
Abstract
The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based thin films on brass substrates for the purpose of corrosion-protective coating was investigated. By varying the process parameters (pulse frequency, pulse width and N2 flow rate) and structure design, including single-layer [...] Read more.
The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based thin films on brass substrates for the purpose of corrosion-protective coating was investigated. By varying the process parameters (pulse frequency, pulse width and N2 flow rate) and structure design, including single-layer and multilayer structures, the obtained results revealed that the Cr-N films deposited through the use of HIPIMS exhibited higher film density and corrosion resistance compared to traditional direct-current magnetron sputtering. Based on the results of a field test using copper-accelerated acetic acid solution, the Cr-N film with a multilayered structure can further extend the time to corrosion onset. This is because the bottom layer in the multilayer structure can block structural defects in the layer above it, effectively reducing the penetration of corrosive agents into the substrate. The high bias voltage, coupled with increased temperature during deposition, led to a dezincification effect, resulting in the reduced adhesion of the film to the substrate and decreased overall corrosion resistance. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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17 pages, 7792 KiB  
Article
The Effect of Plasma Spray Parameters on the Quality of Al-Ni Coatings
by Shenglian Wang, Shuang Chen, Ming Liu, Qinghua Huang, Zimo Liu, Xin Li and Shaofeng Xu
Coatings 2023, 13(12), 2063; https://doi.org/10.3390/coatings13122063 - 9 Dec 2023
Cited by 2 | Viewed by 1897
Abstract
The plasma spray method is widely utilized for enhancing wear, surface fatigue, and corrosion properties through coating. The mechanical and surface characteristics of the resulting coating are contingent upon various spraying parameters, including arc current, working current, spraying distance, and plasma gun traversing [...] Read more.
The plasma spray method is widely utilized for enhancing wear, surface fatigue, and corrosion properties through coating. The mechanical and surface characteristics of the resulting coating are contingent upon various spraying parameters, including arc current, working current, spraying distance, and plasma gun traversing speed. This study investigates the impact of these manufacturing parameters on the porosity, hardness, and bond strength of a coating produced from an Al-Ni alloy applied to a Q235 steel substrate. An extensive experimental program was conducted to analyze the influence of these parameters on the coating properties. Consequently, a preferred combination of parameters, identified through a comprehensive evaluation method, yielded greater performance benefits compared to the orthogonal experimental groups. Full article
(This article belongs to the Special Issue Application of Advanced Plasma Technology in Coatings, Films and Etching)
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