Advanced Ferroelectric Materials and Films: Properties and Applications for Post Moorish Era
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: closed (31 December 2023) | Viewed by 13054
Special Issue Editors
Interests: ferroelectric thin films; hafnium oxide; FeFET; negative capacitance; irradiation effect
Special Issue Information
Dear Colleagues,
High-performance ferroelectric materials are a kind of functional material with wide application prospects. From the current research status, the research, development, and application of high-performance ferroelectric materials are still in the development stage. Researchers choose different ferroelectric materials for research and constantly explore their preparation process, but so far, the research on some properties of ferroelectric materials has not reached a satisfactory level. For example, the types of ceramic powders and polymers used to prepare ferroelectric composites are still very singular, the theoretical research on their composite interface has just begun, and the research on the fatigue resistance of ferroelectric memory devices needs to be developed. In short, ferroelectric materials are a kind of important functional material with broad development prospects. The research and application of their characteristics still need our continuous research, exploration, and attention, especially in the application of ferroelectric materials in microelectronic components in the post-molar era.
This Special Issue aims to highlight the latest progress and application of ferroelectric material science and technology from the aspects of new materials, new structures, and new principles, covering a wide range of fields from theory and modeling, preparation, and characterization to new applications through the combination of original research papers and review articles from leading groups around the world.
Dr. Yongguang Xiao
Prof. Dr. Minghua Tang
Guest Editors
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Keywords
- ferroelectric thin films
- hafnium oxide
- memory devices
- logic devices
- integration of storage and calculation
- ultra-low power consumption
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