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A special issue of Nanomaterials (ISSN 2079-4991).

Deadline for manuscript submissions: closed (30 January 2016) | Viewed by 106702

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Dr. Melanie Ramiasa

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Mawson Institute, Mawson Lakes Campus, University of South Australia, Mawson Lakes, SA 5095, Australia
Interests: material science; surface chemistry; nanorough biomaterials; nanocomposite; plasma polymers
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Prof. Dr. Krasimir Vasilev

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Mawson Institute and School of Engineering, Mawson Lakes Campus, University of South Australia, Mawson Lakes, SA 5095, Australia
Interests: antibacterial coatings; biomaterials; medical devices; plasma polymers; surface modification; biointerfaces; drug delivery; nanomaterials
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Over the last decade, there have been exiting breakthroughs on the utilization of plasma process in the fabrication of a rich diversity of nanomaterials and nanoengineered coatings. Examples include nanowires, nanotubes, nanoparticles, and nanotextured coatings. Some of these materials cannot be derived and do not have analogues with materials obtainable by conventional means. These materials are revolutionizing a spectrum of fields, ranging from electronics to biology and medicine. This Special Issue aims at bringing together the latest advances in the fields of nanofabrication and their application in various fields. In addition, the issue aims at highlighting current challenges and obstacles that lie on the path to fully understand the fundamental physical phenomena underlying the plasma facilitated fabrication of nanomaterials. Further, this Special Issue aims to provide guidance to researchers in the ﬁeld and inform the community of the future directions of the ﬁeld.
We invite investigators to contribute original research articles, as well as review articles that will inspire research towards the next generation of plasma-derived nanomaterials and their applications. Potential topics include, but are not limited to:
-          Plasma synthesis of nanomaterials
-          Plasma nano-etching
-          Plasma nano texturing of surfaces
-          Plasma derived nanoscale coatings
-          Applications of plasma derived nanomaterials and nanoengineered surfaces
-          Modeling of plasma facilitated process for fabrication of nanomaterials

Prof. Dr. Krasimir Vasilev
Dr. Melanie Ramiasa
Guest Editors

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Keywords

plasma nanomaterials
CVD
plasma polymerization
plasma nanosynthesis
plasma deposition
plasma etching

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Published Papers (14 papers)

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Editorial

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143 KiB

Open AccessEditorial

Plasma Nanoengineering and Nanofabrication

by Krasimir Vasilev and Melanie Macgregor Ramiasa

Nanomaterials 2016, 6(7), 122; https://doi.org/10.3390/nano6070122 - 23 Jun 2016

Cited by 3 | Viewed by 5025

Abstract

With the recent advances in nanotechnology, plasma nanofabrication has become an exciting new niche because plasma-based approaches can deliver unique structures at the nanoscale that cannot be achieved by other techniques and/or in a more economical and environmentally friendly manner.[...] Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

Research

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2423 KiB

Open AccessArticle

TiAl₃-TiN Composite Nanoparticles Produced by Hydrogen Plasma-Metal Reaction: Synthesis, Passivation, and Characterization

by Ju Ying Li and Qing Song Mei

Nanomaterials 2016, 6(6), 101; https://doi.org/10.3390/nano6060101 - 1 Jun 2016

Cited by 1 | Viewed by 4938

Abstract

TiAl₃ and TiN composite nanoparticles were continuously synthesized from Ti–48Al master alloy by hydrogen plasma-metal reaction in a N₂, H₂ and Ar atmosphere. The phase, morphology, and size of the nanoparticles were studied by X-ray diffraction (XRD) and transmission electronic microscopy (TEM). X-ray photoelectron spectroscopy (XPS) and evolved gas analysis (EGA) were used to analyze the surface phase constitution and oxygen content of the nanoparticles. The as-synthesized nanopowders were mainly composed of nearly spherical TiAl₃ and tetragonal TiN phases, with a mean diameter of ~42 nm and mass fractions of 49.1% and 24.3%, respectively. Passivation in the atmosphere of Ar and O₂ for 24 h at room temperature led to the formation of amorphous Al₂O₃ shells on the TiAl₃ particle surface, with a mean thickness of ~5.0 nm and a mass fraction of ~23.5%, as well as TiO₂ with a mass fraction of ~3.2%. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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4291 KiB

Open AccessArticle

Effects of Atomization Injection on Nanoparticle Processing in Suspension Plasma Spray

by Hong-bing Xiong, Cheng-yu Zhang, Kai Zhang and Xue-ming Shao

Nanomaterials 2016, 6(5), 94; https://doi.org/10.3390/nano6050094 - 20 May 2016

Cited by 14 | Viewed by 8345

Abstract

Liquid atomization is applied in nanostructure dense coating technology to inject suspended nano-size powder materials into a suspension plasma spray (SPS) torch. This paper presents the effects of the atomization parameters on the nanoparticle processing. A numerical model was developed to simulate the dynamic behaviors of the suspension droplets, the solid nanoparticles or agglomerates, as well as the interactions between them and the plasma gas. The plasma gas was calculated as compressible, multi-component, turbulent jet flow in Eulerian scheme. The droplets and the solid particles were calculated as discrete Lagrangian entities, being tracked through the spray process. The motion and thermal histories of the particles were given in this paper and their release and melting status were observed. The key parameters of atomization, including droplet size, injection angle and velocity were also analyzed. The study revealed that the nanoparticle processing in SPS preferred small droplets with better atomization and less aggregation from suspension preparation. The injection angle and velocity influenced the nanoparticle release percentage. Small angle and low initial velocity might have more nanoparticles released. Besides, the melting percentage of nanoparticles and agglomerates were studied, and the critical droplet diameter to ensure solid melting was drawn. Results showed that most released nanoparticles were well melted, but the agglomerates might be totally melted, partially melted, or even not melted at all, mainly depending on the agglomerate size. For better coating quality, the suspension droplet size should be limited to a critical droplet diameter, which was inversely proportional to the cubic root of weight content, for given critical agglomerate diameter of being totally melted. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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5490 KiB

Open AccessArticle

Post-Plasma SiO_x Coatings of Metal and Metal Oxide Nanoparticles for Enhanced Thermal Stability and Tunable Photoactivity Applications

by Patrick Post, Nicolas Jidenko, Alfred P. Weber and Jean-Pascal Borra

Nanomaterials 2016, 6(5), 91; https://doi.org/10.3390/nano6050091 - 13 May 2016

Cited by 16 | Viewed by 6788

Abstract

The plasma-based aerosol process developed for the direct coating of particles in gases with silicon oxide in a continuous chemical vapor deposition (CVD) process is presented. It is shown that non-thermal plasma filaments induced in a dielectric barrier discharge (DBD) at atmospheric pressure trigger post-DBD gas phase reactions. DBD operating conditions are first scanned to produce ozone and dinitrogen pentoxide. In the selected conditions, these plasma species react with gaseous tetraethyl orthosilicate (TEOS) precursor downstream of the DBD. The gaseous intermediates then condense on the surface of nanoparticles and self-reactions lead to homogeneous solid SiO_x coatings, with thickness from nanometer to micrometer. This confirms the interest of post-DBD injection of the organo-silicon precursor to achieve stable production of actives species with subsequent controlled thickness of SiO_x coatings. SiO_x coatings of spherical and agglomerated metal and metal oxide nanoparticles (Pt, CuO, TiO₂) are achieved. In the selected DBD operating conditions, the thickness of homogeneous nanometer sized coatings of spherical nanoparticles depends on the reaction duration and on the precursor concentration. For agglomerates, operating conditions can be tuned to cover preferentially the interparticle contact zones between primary particles, shifting the sintering of platinum agglomerates to much higher temperatures than the usual sintering temperature. Potential applications for enhanced thermal stability and tunable photoactivity of coated agglomerates are presented. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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1658 KiB

Open AccessCommunication

Highly-Efficient Plasmon-Enhanced Dye-Sensitized Solar Cells Created by Means of Dry Plasma Reduction

by Van-Duong Dao and Ho-Suk Choi

Nanomaterials 2016, 6(4), 70; https://doi.org/10.3390/nano6040070 - 14 Apr 2016

Cited by 32 | Viewed by 5606

Abstract

Plasmon-assisted energy conversion is investigated in a comparative study of dye-sensitized solar cells (DSCs) equipped with photo-anodes, which are fabricated by forming gold (Au) and silver (Ag) nanoparticles (NPs) on an fluorine-doped tin oxide (FTO) glass surface by means of dry plasma reduction (DPR) and coating TiO₂ paste onto the modified FTO glass through a screen printing method. As a result, the FTO/Ag-NPs/TiO₂ photo-anode showed an enhancement of its photocurrent, whereas the FTO/Au-NPs/TiO₂ photo-anode showed less photocurrent than even a standard photo-anode fabricated by simply coating TiO₂ paste onto the modified FTO glass through screen printing. This result stems from the small size and high areal number density of Au-NPs on FTO glass, which prevent the incident light from reaching the TiO₂ layer. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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3379 KiB

Open AccessArticle

Synthesis of Lithium Metal Oxide Nanoparticles by Induction Thermal Plasmas

by Manabu Tanaka, Takuya Kageyama, Hirotaka Sone, Shuhei Yoshida, Daisuke Okamoto and Takayuki Watanabe

Nanomaterials 2016, 6(4), 60; https://doi.org/10.3390/nano6040060 - 6 Apr 2016

Cited by 32 | Viewed by 10000

Abstract

Lithium metal oxide nanoparticles were synthesized by induction thermal plasma. Four different systems—Li–Mn, Li–Cr, Li–Co, and Li–Ni—were compared to understand formation mechanism of Li–Me oxide nanoparticles in thermal plasma process. Analyses of X-ray diffractometry and electron microscopy showed that Li–Me oxide nanoparticles were successfully synthesized in Li–Mn, Li–Cr, and Li–Co systems. Spinel structured LiMn₂O₄ with truncated octahedral shape was formed. Layer structured LiCrO₂ or LiCoO₂ nanoparticles with polyhedral shapes were also synthesized in Li–Cr or Li–Co systems. By contrast, Li–Ni oxide nanoparticles were not synthesized in the Li–Ni system. Nucleation temperatures of each metal in the considered system were evaluated. The relationship between the nucleation temperature and melting and boiling points suggests that the melting points of metal oxides have a strong influence on the formation of lithium metal oxide nanoparticles. A lower melting temperature leads to a longer reaction time, resulting in a higher fraction of the lithium metal oxide nanoparticles in the prepared nanoparticles. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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2126 KiB

Open AccessArticle

Effect of Saturation Pressure Difference on Metal–Silicide Nanopowder Formation in Thermal Plasma Fabrication

by Masaya Shigeta and Takayuki Watanabe

Nanomaterials 2016, 6(3), 43; https://doi.org/10.3390/nano6030043 - 7 Mar 2016

Cited by 23 | Viewed by 5906

Abstract

A computational investigation using a unique model and a solution algorithm was conducted, changing only the saturation pressure of one material artificially during nanopowder formation in thermal plasma fabrication, to highlight the effects of the saturation pressure difference between a metal and silicon. The model can not only express any profile of particle size–composition distribution for a metal–silicide nanopowder even with widely ranging sizes from sub-nanometers to a few hundred nanometers, but it can also simulate the entire growth process involving binary homogeneous nucleation, binary heterogeneous co-condensation, and coagulation among nanoparticles with different compositions. Greater differences in saturation pressures cause a greater time lag for co-condensation of two material vapors during the collective growth of the metal–silicide nanopowder. The greater time lag for co-condensation results in a wider range of composition of the mature nanopowder. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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4135 KiB

Open AccessArticle

Dielectric Barrier Discharge (DBD) Plasma Assisted Synthesis of Ag₂O Nanomaterials and Ag₂O/RuO₂ Nanocomposites

by Antony Ananth and Young Sun Mok

Nanomaterials 2016, 6(3), 42; https://doi.org/10.3390/nano6030042 - 26 Feb 2016

Cited by 51 | Viewed by 9640

Abstract

Silver oxide, ruthenium oxide nanomaterials and its composites are widely used in a variety of applications. Plasma-mediated synthesis is one of the emerging technologies to prepare nanomaterials with desired physicochemical properties. In this study, dielectric barrier discharge (DBD) plasma was used to synthesize Ag₂O and Ag₂O/RuO₂ nanocomposite materials. The prepared materials showed good crystallinity. The surface morphology of the Ag₂O exhibited “garland-like” features, and it changed to “flower-like” and “leaf-like” at different NaOH concentrations. The Ag₂O/RuO₂ composite showed mixed structures of aggregated Ag₂O and sheet-like RuO₂. Mechanisms governing the material’s growth under atmospheric pressure plasma were proposed. Chemical analysis was performed using Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). Thermogravimetric analysis (TGA) showed the thermal decomposition behavior and the oxygen release pattern. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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4343 KiB

Open AccessArticle

Developments of the Physical and Electrical Properties of NiCr and NiCrSi Single-Layer and Bi-Layer Nano-Scale Thin-Film Resistors

by Huan-Yi Cheng, Ying-Chung Chen, Chi-Lun Li, Pei-Jou Li, Mau-Phon Houng and Cheng-Fu Yang

Nanomaterials 2016, 6(3), 39; https://doi.org/10.3390/nano6030039 - 25 Feb 2016

Cited by 13 | Viewed by 6636

Abstract

In this study, commercial-grade NiCr (80 wt % Ni, 20 wt % Cr) and NiCrSi (55 wt % Ni, 40 wt % Cr, 5 wt % Si) were used as targets and the sputtering method was used to deposit NiCr and NiCrSi thin films on Al₂O₃ and Si substrates at room temperature under different deposition time. X-ray diffraction patterns showed that the NiCr and NiCrSi thin films were amorphous phase, and the field-effect scanning electronic microscope observations showed that only nano-crystalline grains were revealed on the surfaces of the NiCr and NiCrSi thin films. The log (resistivity) values of the NiCr and NiCrSi thin-film resistors decreased approximately linearly as their thicknesses increased. We found that the value of temperature coefficient of resistance (TCR value) of the NiCr thin-film resistors was positive and that of the NiCrSi thin-film resistors was negative. To investigate these thin-film resistors with a low TCR value, we designed a novel bi-layer structure to fabricate the thin-film resistors via two different stacking methods. The bi-layer structures were created by depositing NiCr for 10 min as the upper (or lower) layer and depositing NiCrSi for 10, 30, or 60 min as the lower (or upper) layer. We aim to show that the stacking method had no apparent effect on the resistivity of the NiCr-NiCrSi bi-layer thin-film resistors but had large effect on the TCR value. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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5144 KiB

Open AccessArticle

Thermal Plasma Synthesis of Crystalline Gallium Nitride Nanopowder from Gallium Nitrate Hydrate and Melamine

by Tae-Hee Kim, Sooseok Choi and Dong-Wha Park

Nanomaterials 2016, 6(3), 38; https://doi.org/10.3390/nano6030038 - 24 Feb 2016

Cited by 9 | Viewed by 8869

Abstract

Gallium nitride (GaN) nanopowder used as a blue fluorescent material was synthesized by using a direct current (DC) non-transferred arc plasma. Gallium nitrate hydrate (Ga(NO₃)₃∙xH₂O) was used as a raw material and NH₃ gas was used as a nitridation source. Additionally, melamine (C₃H₆N₆) powder was injected into the plasma flame to prevent the oxidation of gallium to gallium oxide (Ga₂O₃). Argon thermal plasma was applied to synthesize GaN nanopowder. The synthesized GaN nanopowder by thermal plasma has low crystallinity and purity. It was improved to relatively high crystallinity and purity by annealing. The crystallinity is enhanced by the thermal treatment and the purity was increased by the elimination of residual C₃H₆N₆. The combined process of thermal plasma and annealing was appropriate for synthesizing crystalline GaN nanopowder. The annealing process after the plasma synthesis of GaN nanopowder eliminated residual contamination and enhanced the crystallinity of GaN nanopowder. As a result, crystalline GaN nanopowder which has an average particle size of 30 nm was synthesized by the combination of thermal plasma treatment and annealing. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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3001 KiB

Open AccessArticle

Resistive Switching of Plasma–Treated Zinc Oxide Nanowires for Resistive Random Access Memory

by Yunfeng Lai, Wenbiao Qiu, Zecun Zeng, Shuying Cheng, Jinling Yu and Qiao Zheng

Nanomaterials 2016, 6(1), 16; https://doi.org/10.3390/nano6010016 - 13 Jan 2016

Cited by 24 | Viewed by 7017

Abstract

ZnO nanowires (NWs) were grown on Si(100) substrates at 975 °C by a vapor-liquid-solid method with ~2 nm and ~4 nm gold thin films as catalysts, followed by an argon plasma treatment for the as-grown ZnO NWs. A single ZnO NW–based memory cell with a Ti/ZnO/Ti structure was then fabricated to investigate the effects of plasma treatment on the resistive switching. The plasma treatment improves the homogeneity and reproducibility of the resistive switching of the ZnO NWs, and it also reduces the switching (set and reset) voltages with less fluctuations, which would be associated with the increased density of oxygen vacancies to facilitate the resistive switching as well as to average out the stochastic movement of individual oxygen vacancies. Additionally, a single ZnO NW–based memory cell with self-rectification could also be obtained, if the inhomogeneous plasma treatment is applied to the two Ti/ZnO contacts. The plasma-induced oxygen vacancy disabling the rectification capability at one of the Ti/ZnO contacts is believed to be responsible for the self-rectification in the memory cell. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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3433 KiB

Open AccessArticle

Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances

by Onkar Mangla, Savita Roy and Kostya (Ken) Ostrikov

Nanomaterials 2016, 6(1), 4; https://doi.org/10.3390/nano6010004 - 29 Dec 2015

Cited by 19 | Viewed by 7168

Abstract

The hot and dense plasma formed in modified dense plasma focus (DPF) device has been used worldwide for the nanofabrication of several materials. In this paper, we summarize the fabrication of III–V semiconductor nanostructures using the high fluence material ions produced by hot, dense and extremely non-equilibrium plasma generated in a modified DPF device. In addition, we present the recent results on the fabrication of porous nano-gallium arsenide (GaAs). The details of morphological, structural and optical properties of the fabricated nano-GaAs are provided. The effect of rapid thermal annealing on the above properties of porous nano-GaAs is studied. The study reveals that it is possible to tailor the size of pores with annealing temperature. The optical properties of these porous nano-GaAs also confirm the possibility to tailor the pore sizes upon annealing. Possible applications of the fabricated and subsequently annealed porous nano-GaAs in transmission-type photo-cathodes and visible optoelectronic devices are discussed. These results suggest that the modified DPF is an effective tool for nanofabrication of continuous and porous III–V semiconductor nanomaterials. Further opportunities for using the modified DPF device for the fabrication of novel nanostructures are discussed as well. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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12052 KiB

Open AccessArticle

Nanostructuring of Palladium with Low-Temperature Helium Plasma

by P. Fiflis, M.P. Christenson, N. Connolly and D.N. Ruzic

Nanomaterials 2015, 5(4), 2007-2018; https://doi.org/10.3390/nano5042007 - 25 Nov 2015

Cited by 14 | Viewed by 5178

Abstract

Impingement of high fluxes of helium ions upon metals at elevated temperatures has given rise to the growth of nanostructured layers on the surface of several metals, such as tungsten and molybdenum. These nanostructured layers grow from the bulk material and have greatly increased surface area over that of a not nanostructured surface. They are also superior to deposited nanostructures due to a lack of worries over adhesion and differences in material properties. Several palladium samples of varying thickness were biased and exposed to a helium helicon plasma. The nanostructures were characterized as a function of the thickness of the palladium layer and of temperature. Bubbles of ~100 nm in diameter appear to be integral to the nanostructuring process. Nanostructured palladium is also shown to have better catalytic activity than not nanostructured palladium. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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Review

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3899 KiB

Open AccessFeature PaperReview

Selective Plasma Etching of Polymeric Substrates for Advanced Applications

by Harinarayanan Puliyalil and Uroš Cvelbar

Nanomaterials 2016, 6(6), 108; https://doi.org/10.3390/nano6060108 - 7 Jun 2016

Cited by 101 | Viewed by 13727

Abstract

In today’s nanoworld, there is a strong need to manipulate and process materials on an atom-by-atom scale with new tools such as reactive plasma, which in some states enables high selectivity of interaction between plasma species and materials. These interactions first involve preferential interactions with precise bonds in materials and later cause etching. This typically occurs based on material stability, which leads to preferential etching of one material over other. This process is especially interesting for polymeric substrates with increasing complexity and a “zoo” of bonds, which are used in numerous applications. In this comprehensive summary, we encompass the complete selective etching of polymers and polymer matrix micro-/nanocomposites with plasma and unravel the mechanisms behind the scenes, which ultimately leads to the enhancement of surface properties and device performance. Full article

(This article belongs to the Special Issue Plasma Nanoengineering and Nanofabrication)

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